Electron-beam evaporation

The e-beam evaporator system can deposit films

• Box-shaped chamber with front door, cylindrical chamber with top lid
• Load-lock with substrate treatment (plasma, ion gun, heating, oxidation)
• Up to 8″ standard single or multiple substrates
• Various sample holder functions: heating, water cooling, rotation and/or tilt, LN₂
• Ion gun for sample preparation, etching or assisted deposition (IAD)