This Edwards 306 thermal evaporator uses a standard resistive filament evaporation source for thermal evaporation of metals. The evaporation happens in a quartz bell jar deposition chamber and is controlled manually. The tool incorporates a diffusion pump and reaches a base pressure of 1E-6 Torr. The system is equipped with a quartz crystal monitor for manual thickness control.
Available metals
The tool is dedicated to the deposition of Pd, Cr, Au, Al and Cu.
Specifications
- Diffusion pump with base pressure 1E-6 Torr
- One power source
- 1 wafer holder
- Crystal monitor model: Edwards FTMS5
